Lynntech has received a sequential phase II award to continue development of a self-regenerating dust mask technology (~$1M). We are currently developing a rugged, novel particulate dust mask suitable for extended wear that significantly reduces the amount of dust respired in operational environments with high particulate matter levels, such as in Southwest Asia. This dust mask incorporates a highly innovative self-cleaning mechanism which requires no external power. This enables the mask to continuously self-clean and actively resist clogging, which maintains low breathing resistance during very high airflows to protect…
